PlasmaQuant MS Series

Analytik Jena -PlasmaQuant MS Series

Inductively Coupled Plasma Mass Spectrometry (ICP-MS) is a widely used standard for fast, sensitive, and versatile elemental analysis across numerous industries. With its PlasmaQuant MS series, Analytik Jena sets new benchmarks—offering instruments that deliver exceptional reliability, precision, and throughput. Designed to meet the highest demands in sample handling, robustness, and regulatory compliance, the PlasmaQuant MS series ensures top-tier performance for even the most challenging analytical tasks.

Market Leading Performance and Lowest Running Costs

Analytik Jena’s ICP-MS solutions deliver market-leading sensitivity, empowering laboratories to handle increasing sample volumes and tighter timelines—without compromising analytical precision or reproducibility.

These instruments provide exceptional detection capabilities, with excellent mass separation and unmatched sensitivity of up to 1500 Mcps/ppm at less than 2% CeO. This enables the accurate identification of ultra-trace elemental concentrations, low-abundance isotopes, and even single particles as small as 5 nanometers. They also ensure highly precise isotope ratio determinations.

While sensitivity and precision are critical, the speed of analysis is equally important in many applications. PlasmaQuant MS systems address this need with industry-leading throughput, analyzing up to 80 samples per hour*. The high sensitivity of the system translates into both superior performance and lower cost per sample.

In addition, these instruments feature a robust plasma flame that delivers excellent long-term stability. This makes them ideal for analyzing samples with high matrix loads and ensures minimal signal drift, even with variable sample compositions.

German-engineered for efficiency, Analytik Jena’s ICP-MS systems offer significant cost advantages in daily operation. They consume up to 50% less argon gas—around 10 liters per minute—resulting in substantial savings in plasma operating costs. Combined with their open-access design for easy maintenance and patented spectrometer technology, these systems reduce downtime and operating costs, making them an outstanding choice for high-throughput, high-precision analysis.

*Based on Analytik Jena’s Application Note: High-throughput Analysis of Drinking Water with ICP-MS

Sensitivity and Efficiency

The PlasmaQuant MS stands out with its exceptional sensitivity, offering clear advantages in both analytical performance and operational efficiency. Its patented spectrometer design enables ultra-low detection limits and maintains consistent analytical quality—even during very short integration times and at high dilution levels. This not only supports high sample throughput and reliable long-term stability but also ensures reproducible results across a wide range of applications.

The system’s robust design minimizes the need for frequent maintenance, while its ability to handle complex samples with reduced preparation makes laboratory workflows more efficient and cost-effective. With its unmatched detection capabilities, high-speed performance, and low operational demands, the PlasmaQuant MS is an ideal solution for modern, high-throughput laboratories.

Patented Technology and Ingenious Solutions with PlasmaQuant MS

Analytik Jena’s PlasmaQuant MS series combines innovative, patented technologies with practical solutions to deliver unmatched performance, cost efficiency, and analytical flexibility in ICP-MS.

At the core of its efficiency is the Eco Plasma system, specially developed for a wide range of sample matrices—from wastewater to organic solvents. With argon gas consumption reduced to less than 9 L/min, low oxide formation (<2% CeO+/Ce+), and minimal double ion production (<3% Ba++/Ba+), this robust plasma setup ensures long-term stability while significantly lowering operational costs. Plasma power adjustable from 300 to 1600 W provides optimal conditions for any application.

To tackle spectral interferences effectively, the iCRC (integrated Collision Reaction Cell) uses helium and hydrogen gases, depending on the matrix, to eliminate interferences quickly and reliably. The system’s BOOST technology maintains sensitivity during gas mode, ensuring precise results even when analytes are measured under interference-reducing conditions.

The ReflexION ion optics system further enhances sensitivity. Its patented 90-degree reflection and 3D focusing of the ion beam ensure maximum signal intensity across all analyte ions while preventing photons and neutral particles from reaching the detector—minimizing background noise and improving detection limits.

For high-resolution and fast mass separation, the HD Quadrupole system operates at a true 3 MHz with a scan speed of over 5000 amu/sec and ultra-low background noise (<1 cps). Covering a mass range of 3 to 260 amu, it is ideal for stable isotope analysis, laser ablation, and single particle detection. Optional AMR (adaptive mass range) functionality enables better resolution for isotopes with m/z values above 230.

All-digital detection (AD Detection) provides an impressive 11 orders of dynamic range using pulse-counting mode only. This allows precise multi-element analysis from ultra-trace levels to high concentrations within a single run—while also extending detector lifespan.

To further support demanding applications, Nitrox enables the online addition of nitrogen or oxygen to plasma gases. This enhances ionization efficiency, reduces matrix effects, and simplifies the direct analysis of organic solvents. For high TDS samples such as seawater, the Aerosol Dilution system eliminates the need for time-consuming manual dilution, allowing direct measurement with high accuracy and stability.

Together, these technologies make the PlasmaQuant MS an exceptionally powerful and versatile ICP-MS platform—combining sensitivity, speed, cost-efficiency, and ease of use for both routine and research-level applications.

Standards

(EU) 2017/746 (IVDR), DIN EN 14385, DIN EN ISO 17294-1, DIN EN ISO 17294-2, EN 16172, EN 71-3, EPA 200.8, Ersatzbaustoffverordnung (EBV), HJ 766, ISO 105-E04, ISO 14869, ISO 16967, ISO 16968, SEMI C33, SEMI F57, USP 232, USP 233